• Room 01.019 - New Physics

    United Kingdom

Accepting PhD Students

20062023

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  • 2013

    Ferroelectric hafnium oxide: A CMOS-compatible and highly scalable approach to future ferroelectric memories

    Muller, J., Boscke, T. S., Muller, S., Yurchuk, E., Polakowski, P., Paul, J., Martin, D., Schenk, T., Khullar, K., Kersch, A., Weinreich, W., Riedel, S., Seidel, K., Kumar, A., Arruda, T. M., Kalinin, S. V., Schlosser, T., Boschke, R., van Bentum, R., Schroder, U., & 1 othersMikolajick, T., 01 Dec 2013, Electron Devices Meeting (IEDM), 2013 IEEE International. p. 10.8.1-10.8.4

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    144 Citations (Scopus)