A dynamic sampling methodology for multi-site wafer metrology

P. K S Prakash, Bahman Honari, A. Johnston, Seán McLoone

Research output: Contribution to conferenceAbstract

Original languageEnglish
Publication statusPublished - 2012
EventThe European Advanced Process Control and Manufacturing (APCM) Conference - Grenoble, France
Duration: 16 Apr 201219 Apr 2012

Conference

ConferenceThe European Advanced Process Control and Manufacturing (APCM) Conference
CountryFrance
CityGrenoble
Period16/04/201219/04/2012

Cite this