A dynamic sampling methodology for multi-site wafer metrology

P. K S Prakash, Bahman Honari, A. Johnston, Seán McLoone

Research output: Contribution to conference › Abstract

Original language	English
Publication status	Published - 2012
Event	The European Advanced Process Control and Manufacturing (APCM) Conference - Grenoble, France Duration: 16 Apr 2012 → 19 Apr 2012

Conference	The European Advanced Process Control and Manufacturing (APCM) Conference
Country/Territory	France
City	Grenoble
Period	16/04/2012 → 19/04/2012

Cite this

@conference{bf9c1b1fff7b4ae9b1bfe6eda0df23f6,

title = "A dynamic sampling methodology for multi-site wafer metrology",

author = "Prakash, {P. K S} and Bahman Honari and A. Johnston and Se{\'a}n McLoone",

year = "2012",

language = "English",

note = "The European Advanced Process Control and Manufacturing (APCM) Conference ; Conference date: 16-04-2012 Through 19-04-2012",

}