Achieving microfocus of the 13.5-NM flash beam for exploring matter under extreme conditions

A. J. Nelson, R. W. Lee, S. Toleikis, S. Bajt, R. R. Fäustlin, H. Chapman, J. Krzywinski, J. Chalupsky, L. Juha, V. Hajkova, B. Nagler, S. M. Vinko, T. Whitcher, J.S. Wark, T. Dzelzainis, D. Riley, K. Saksl, A.R. Khorsand, R. Sobierajski, M. JurekJ. Andreasson, N. Timneanu, J. Hadju, M. Fajardo, T. Tschentscher

Research output: Chapter in Book/Report/Conference proceedingConference contribution


We have focused a beam (BL3) of FLASH (Free-electron LASer in Hamburg: δ=13.5 nm, pulse length 15 fs, pulse energy 10-40 μJ, 5Hz) using a fine polished off-axis parabola having a focal length of 270 mm and coated with a Mo/Si multilayer with an initial reflectivity of 67% at 13.5 nm. The OAP was mounted and aligned with a picomotor controlled six-axis gimbal. Beam imprints on poly(methyl methacrylate) - PMMA were used to measure focus and the focused beam was used to create isochoric heating of various slab targets. Results show the focal spot has a diameter of ≤1 μm producing intensities greater than 1016 W cm-2. Observations were correlated with simulations of best focus to provide further relevant information. This focused XUV laser beam now allows us to begin exploring matter under extreme conditions.

Original languageEnglish
Title of host publicationFEL 2009 - 31st International Free Electron Laser Conference
Number of pages5
Publication statusPublished - 2009
Event31st International Free Electron Laser Conference, FEL 2009 - Liverpool, United Kingdom
Duration: 23 Aug 200928 Aug 2009


Conference31st International Free Electron Laser Conference, FEL 2009
Country/TerritoryUnited Kingdom

ASJC Scopus subject areas

  • Nuclear and High Energy Physics


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