Anatase thin films on glass from the chemical vapor deposition of titanium(IV) chloride and ethyl acetate

S.A. O'Neill; R.J.H. Clark; I.P. Parkin; N. Elliott; Andrew Mills

doi:10.1021/cm020707f

Anatase thin films on glass from the chemical vapor deposition of titanium(IV) chloride and ethyl acetate

S.A. O'Neill, R.J.H. Clark, I.P. Parkin, N. Elliott, Andrew Mills

School of Chemistry and Chemical Engineering

Research output: Contribution to journal › Article › peer-review

73 Citations (Scopus)

Abstract

Thin (50-500 nm) films of TiO2 may be deposited on glass substrates by the atmospheric pressure chemical vapor deposition (APCVD) reaction of TiCl4 with ethyl acetate at 400600 C. The TiO2 films are exclusively in the form of anatase, as established by Raman microscopy and glancing angle X-ray diffraction. X-ray photoelectron spectroscopy gave a 1:2 Ti:O ratio with Ti 2P(3/2) at 458.6 eV and O 1s is at 530.6 eV. The water droplet contact angle drops from 60degrees to

Original language	English
Pages (from-to)	46-50
Number of pages	5
Journal	Chemistry of Materials
Volume	15
Issue number	1
DOIs	https://doi.org/10.1021/cm020707f
Publication status	Published - 14 Jan 2003

ASJC Scopus subject areas

General Materials Science
Materials Chemistry

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10.1021/cm020707f

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abstract = "Thin (50-500 nm) films of TiO2 may be deposited on glass substrates by the atmospheric pressure chemical vapor deposition (APCVD) reaction of TiCl4 with ethyl acetate at 400600 C. The TiO2 films are exclusively in the form of anatase, as established by Raman microscopy and glancing angle X-ray diffraction. X-ray photoelectron spectroscopy gave a 1:2 Ti:O ratio with Ti 2P(3/2) at 458.6 eV and O 1s is at 530.6 eV. The water droplet contact angle drops from 60degrees to",

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AU - O'Neill, S.A.

AU - Clark, R.J.H.

AU - Parkin, I.P.

AU - Elliott, N.

AU - Mills, Andrew

PY - 2003/1/14

Y1 - 2003/1/14

N2 - Thin (50-500 nm) films of TiO2 may be deposited on glass substrates by the atmospheric pressure chemical vapor deposition (APCVD) reaction of TiCl4 with ethyl acetate at 400600 C. The TiO2 films are exclusively in the form of anatase, as established by Raman microscopy and glancing angle X-ray diffraction. X-ray photoelectron spectroscopy gave a 1:2 Ti:O ratio with Ti 2P(3/2) at 458.6 eV and O 1s is at 530.6 eV. The water droplet contact angle drops from 60degrees to

AB - Thin (50-500 nm) films of TiO2 may be deposited on glass substrates by the atmospheric pressure chemical vapor deposition (APCVD) reaction of TiCl4 with ethyl acetate at 400600 C. The TiO2 films are exclusively in the form of anatase, as established by Raman microscopy and glancing angle X-ray diffraction. X-ray photoelectron spectroscopy gave a 1:2 Ti:O ratio with Ti 2P(3/2) at 458.6 eV and O 1s is at 530.6 eV. The water droplet contact angle drops from 60degrees to

U2 - 10.1021/cm020707f

DO - 10.1021/cm020707f

M3 - Article

SN - 0897-4756

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SP - 46

EP - 50

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 1

ER -

Anatase thin films on glass from the chemical vapor deposition of titanium(IV) chloride and ethyl acetate

Abstract

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