Anomaly Detection through on-line Isolation Forest: An application to plasma etching

Gian Antonio Susto, Alessandro Beghi, Sean McLoone

Research output: Contribution to conferencePaper

Original languageEnglish
Publication statusPublished - 15 May 2017
Event28th Annual SEMI Advanced Semiconductor Manufacturing Conference - Saratoga Springs, United States
Duration: 15 May 201718 May 2017

Conference

Conference28th Annual SEMI Advanced Semiconductor Manufacturing Conference
CountryUnited States
CitySaratoga Springs
Period15/05/201718/05/2017

Cite this

Susto, G. A., Beghi, A., & McLoone, S. (2017). Anomaly Detection through on-line Isolation Forest: An application to plasma etching. Paper presented at 28th Annual SEMI Advanced Semiconductor Manufacturing Conference, Saratoga Springs, United States. http://asmc2017.conferencespot.org/polopoly_fs/1.3585615.1494356183!/fileserver/file/768609/filename/04.4.pdf