Atmospheric pressure chemical vapour deposition of boron doped titanium dioxide for photocatalytic water reduction and oxidation

P. Carmichael, D. Hazafy, D.S. Bhachu, A. Mills, J.A. Darr, I.P. Parkin

Research output: Contribution to journalArticlepeer-review

23 Citations (Scopus)
313 Downloads (Pure)

Abstract

Boron-doped titanium dioxide (B-TiO) films were deposited by atmospheric pressure chemical vapour deposition of titanium(iv) chloride, ethyl acetate and tri-isopropyl borate on steel and fluorine-doped-tin oxide substrates at 500, 550 and 600 °C, respectively. The films were characterised using powder X-ray diffraction (PXRD), which showed anatase phase TiO at lower deposition temperatures (500 and 550 °C) and rutile at higher deposition temperatures (600 °C). X-ray photoelectron spectroscopy (XPS) showed a dopant level of 0.9 at% B in an O-substitutional position. The ability of the films to reduce water was tested in a sacrificial system using 365 nm UV light with an irradiance of 2 mW cm. Hydrogen production rates of B-TiO at 24 μL cm h far exceeded undoped TiO at 2.6 μL cm h. The B-TiO samples were also shown to be active for water oxidation in a sacrificial solution. Photocurrent density tests also revealed that B-doped samples performed better, with an earlier onset of photocurrent.
Original languageEnglish
Pages (from-to)16788-16794, Impact Factor: 4.5
Journal Physical Chemistry Chemical Physics
Volume15
Early online date22 Aug 2013
DOIs
Publication statusPublished - 2013

Fingerprint

Dive into the research topics of 'Atmospheric pressure chemical vapour deposition of boron doped titanium dioxide for photocatalytic water reduction and oxidation'. Together they form a unique fingerprint.

Cite this