Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass

S.A. O'Neill, Michael Parkin, R.J.H. Clark, Andrew Mills, N. Elliott

Research output: Contribution to journalArticle

74 Citations (Scopus)

Abstract

Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass substrates was achieved by the reaction of TiCl4 and a co-oxygen source (MeOH, EtOH, (PrOH)-Pr-i or H2O) at 500-650degreesC. The coatings show excellent uniformity, surface coverage and adherence. Growth rates were of the order of 0.3 mum min(-1) at 500degreesC. All films are crystalline and single phase with XRD showing the anatase TiO2 diffraction pattern; a = 3.78(1), c = 9.51(1) Angstrom. Optically, the films show minimal reflectivity from 300-1600 nm and 50-80% total transmission from 300-800 nm. Contact angles are in the range 20-40degrees for as-prepared films and 1-10degrees after 30 min irradiation at 254 nm. All of the films show significant photocatalyic activity as regards the destruction of an overlayer of stearic acid.
Original languageEnglish
Pages (from-to)56-60
Number of pages5
JournalJournal of Materials Chemistry
Volume13
Issue number1
DOIs
Publication statusPublished - 01 Jan 2003

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Materials Science(all)
  • Materials Chemistry

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