Atomic oxygen surface loss coefficient measurements in a capacitive/inductive radio-frequency plasma

S. Gomez; P.G. Steen; William Graham

doi:10.1063/1.1490630

Atomic oxygen surface loss coefficient measurements in a capacitive/inductive radio-frequency plasma

S. Gomez, P.G. Steen, William Graham

Research output: Contribution to journal › Article › peer-review

89 Citations (Scopus)

Abstract

Spatially resolved measurements of the atomic oxygen densities close to a sample surface in a dual mode (capacitive/inductive) rf plasma are used to measure the atomic oxygen surface loss coefficient beta on stainless steel and aluminum substrates, silicon and silicon dioxide wafers, and on polypropylene samples. beta is found to be particularly sensitive to the gas pressure for both operating modes. It is concluded that this is due to the effect of changing atom and ion flux to the surface. (C) 2002 American Institute of Physics.

Original language	English
Pages (from-to)	19-21
Number of pages	3
Journal	Applied Physics Letters
Volume	81(1)
Issue number	1
DOIs	https://doi.org/10.1063/1.1490630
Publication status	Published - 01 Jul 2002

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.1490630

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abstract = "Spatially resolved measurements of the atomic oxygen densities close to a sample surface in a dual mode (capacitive/inductive) rf plasma are used to measure the atomic oxygen surface loss coefficient beta on stainless steel and aluminum substrates, silicon and silicon dioxide wafers, and on polypropylene samples. beta is found to be particularly sensitive to the gas pressure for both operating modes. It is concluded that this is due to the effect of changing atom and ion flux to the surface. (C) 2002 American Institute of Physics.",

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Atomic oxygen surface loss coefficient measurements in a capacitive/inductive radio-frequency plasma

Abstract

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