Characterisation of copper CVD films deposited using a Cu(I)(hfac)TMVS precursor

B.H.W. Toh, V.S.C. Len, David McNeill, Harold Gamble

Research output: Contribution to conferencePaper

Original languageEnglish
Pages253-256
Number of pages4
Publication statusPublished - Dec 2000
EventProceedings of International Conference on Communications, Computers & Devices, ICCCD-2000 - Kharagpur, India
Duration: 01 Dec 200001 Dec 2000

Conference

ConferenceProceedings of International Conference on Communications, Computers & Devices, ICCCD-2000
CountryIndia
CityKharagpur
Period01/12/200001/12/2000

Cite this

Toh, B. H. W., Len, V. S. C., McNeill, D., & Gamble, H. (2000). Characterisation of copper CVD films deposited using a Cu(I)(hfac)TMVS precursor. 253-256. Paper presented at Proceedings of International Conference on Communications, Computers & Devices, ICCCD-2000, Kharagpur, India.