|Number of pages||4|
|Publication status||Published - Oct 2000|
|Event||Proceedings of 3rd International Conference on Materials for Microelectronics - Dublin, Ireland|
Duration: 01 Oct 2000 → 01 Oct 2000
|Conference||Proceedings of 3rd International Conference on Materials for Microelectronics|
|Period||01/10/2000 → 01/10/2000|
Len, V. S. C., Toh, B. H. W., McNeill, D., & Gamble, H. (2000). Characterisation of copper CVD films deposited using copper (I) hexafluoroacetylacetonate trimethylvinylsilane - effects of water vapour and post annealing. 243-246. Paper presented at Proceedings of 3rd International Conference on Materials for Microelectronics, Dublin, Ireland.