Characterisation of copper inductors fabricated by dual damascene and electroplating techniques

B.H.W. Toh, David McNeill, Harold Gamble

Research output: Contribution to journalArticle

1 Citation (Scopus)
LanguageEnglish
Pages233-238
Number of pages6
JournalJournal of Materials Science: Materials in Electronics
Volume16(4)
Issue number4
Publication statusPublished - Apr 2005

Cite this

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title = "Characterisation of copper inductors fabricated by dual damascene and electroplating techniques",
author = "B.H.W. Toh and David McNeill and Harold Gamble",
year = "2005",
month = "4",
language = "English",
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journal = "Journal of Materials Science: Materials in Electronics",
issn = "0957-4522",
publisher = "Springer New York",
number = "4",

}

Characterisation of copper inductors fabricated by dual damascene and electroplating techniques. / Toh, B.H.W.; McNeill, David; Gamble, Harold.

In: Journal of Materials Science: Materials in Electronics, Vol. 16(4), No. 4, 04.2005, p. 233-238.

Research output: Contribution to journalArticle

TY - JOUR

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AU - McNeill, David

AU - Gamble, Harold

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T2 - Journal of Materials Science: Materials in Electronics

JF - Journal of Materials Science: Materials in Electronics

SN - 0957-4522

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