Comparison of NMF and Kernel NMF in applications to OES plasma etching datasets

Emanuele Ragnoli, Seán McLoone, John Ringwood, N. MacGearailt

Research output: Contribution to conferencePoster

Original languageEnglish
Pages77
Publication statusPublished - 2008
EventIntel European Research and Innovation Conference - Leixlip, Ireland
Duration: 10 Sept 200812 Sept 2008

Conference

ConferenceIntel European Research and Innovation Conference
Country/TerritoryIreland
CityLeixlip
Period10/09/200812/09/2008

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