Comparison of Si1-yCy films produced by solid-phase epitaxy and rapid thermal chemical vapour deposition

S.K. Ray, David McNeill, D.L. Gay, C.K. Maiti, Alastair Armstrong, Mervyn Armstrong, Harold Gamble

Research output: Contribution to journalArticle

11 Citations (Scopus)
LanguageEnglish
Pages149-152
Number of pages4
JournalThin Solid Films
Volume294(1-2)
Publication statusPublished - Feb 1997

Cite this

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title = "Comparison of Si1-yCy films produced by solid-phase epitaxy and rapid thermal chemical vapour deposition",
author = "S.K. Ray and David McNeill and D.L. Gay and C.K. Maiti and Alastair Armstrong and Mervyn Armstrong and Harold Gamble",
year = "1997",
month = "2",
language = "English",
volume = "294(1-2)",
pages = "149--152",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",

}

Comparison of Si1-yCy films produced by solid-phase epitaxy and rapid thermal chemical vapour deposition. / Ray, S.K.; McNeill, David; Gay, D.L.; Maiti, C.K.; Armstrong, Alastair; Armstrong, Mervyn; Gamble, Harold.

In: Thin Solid Films, Vol. 294(1-2), 02.1997, p. 149-152.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Comparison of Si1-yCy films produced by solid-phase epitaxy and rapid thermal chemical vapour deposition

AU - Ray, S.K.

AU - McNeill, David

AU - Gay, D.L.

AU - Maiti, C.K.

AU - Armstrong, Alastair

AU - Armstrong, Mervyn

AU - Gamble, Harold

PY - 1997/2

Y1 - 1997/2

M3 - Article

VL - 294(1-2)

SP - 149

EP - 152

JO - Thin Solid Films

T2 - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -