Comparison of Si1-yCy films produced by solid-phase epitaxy and rapid thermal chemical vapour deposition

S.K. Ray, David McNeill, D.L. Gay, C.K. Maiti, Alastair Armstrong, Mervyn Armstrong, Harold Gamble

Research output: Contribution to journal › Article › peer-review

Cite this

@article{cd573a13c3764f11b5fb1f05e535a7d7,

title = "Comparison of Si1-yCy films produced by solid-phase epitaxy and rapid thermal chemical vapour deposition",

author = "S.K. Ray and David McNeill and D.L. Gay and C.K. Maiti and Alastair Armstrong and Mervyn Armstrong and Harold Gamble",

year = "1997",

month = feb,

language = "English",

volume = "294(1-2)",

pages = "149--152",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

}

TY - JOUR

T1 - Comparison of Si1-yCy films produced by solid-phase epitaxy and rapid thermal chemical vapour deposition

AU - Ray, S.K.

AU - McNeill, David

AU - Gay, D.L.

AU - Maiti, C.K.

AU - Armstrong, Alastair

AU - Armstrong, Mervyn

AU - Gamble, Harold

PY - 1997/2

Y1 - 1997/2

M3 - Article

VL - 294(1-2)

SP - 149

EP - 152

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -