Controlling the Self-Injection Threshold in Laser Wakefield Accelerators

S. Kuschel*, M. B. Schwab, M. Yeung, D. Hollatz, A. Seidel, W. Ziegler, A. Sävert, M. C. Kaluza, M. Zepf

*Corresponding author for this work

Research output: Contribution to journalArticle

5 Citations (Scopus)
154 Downloads (Pure)

Abstract

Controlling the parameters of a laser plasma accelerated electron beam is a topic of intense research with a particular focus placed on controlling the injection phase of electrons into the accelerating structure from the background plasma. An essential prerequisite for high-quality beams is dark-current free acceleration (i.e., no electrons accelerated beyond those deliberately injected). We show that small-scale density ripples in the background plasma are sufficient to cause the uncontrolled (self-)injection of electrons. Such ripples can be as short as ∼50 μm and can therefore not be resolved by standard interferometry. Background free injection with substantially improved beam characteristics (divergence and pointing) is demonstrated in a gas cell designed for a controlled gas flow. The results are supported by an analytical theory as well as 3D particle in cell simulations.

Original languageEnglish
Article number154801
Number of pages6
JournalPhysical Review Letters
Volume121
Issue number15
DOIs
Publication statusPublished - 08 Oct 2018

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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