Controlling the Self-Injection Threshold in Laser Wakefield Accelerators

S. Kuschel*, M. B. Schwab, M. Yeung, D. Hollatz, A. Seidel, W. Ziegler, A. Sävert, M. C. Kaluza, M. Zepf

*Corresponding author for this work

Research output: Contribution to journalArticle

2 Citations (Scopus)
99 Downloads (Pure)

Abstract

Controlling the parameters of a laser plasma accelerated electron beam is a topic of intense research with a particular focus placed on controlling the injection phase of electrons into the accelerating structure from the background plasma. An essential prerequisite for high-quality beams is dark-current free acceleration (i.e., no electrons accelerated beyond those deliberately injected). We show that small-scale density ripples in the background plasma are sufficient to cause the uncontrolled (self-)injection of electrons. Such ripples can be as short as ∼50 μm and can therefore not be resolved by standard interferometry. Background free injection with substantially improved beam characteristics (divergence and pointing) is demonstrated in a gas cell designed for a controlled gas flow. The results are supported by an analytical theory as well as 3D particle in cell simulations.

Original languageEnglish
Article number154801
Number of pages6
JournalPhysical Review Letters
Volume121
Issue number15
DOIs
Publication statusPublished - 08 Oct 2018

Fingerprint

accelerators
injection
ripples
thresholds
lasers
electrons
dark current
cells
laser plasmas
gas flow
divergence
interferometry
electron beams
causes
gases
simulation

Cite this

Kuschel, S., Schwab, M. B., Yeung, M., Hollatz, D., Seidel, A., Ziegler, W., ... Zepf, M. (2018). Controlling the Self-Injection Threshold in Laser Wakefield Accelerators. Physical Review Letters, 121(15), [154801]. https://doi.org/10.1103/PhysRevLett.121.154801
Kuschel, S. ; Schwab, M. B. ; Yeung, M. ; Hollatz, D. ; Seidel, A. ; Ziegler, W. ; Sävert, A. ; Kaluza, M. C. ; Zepf, M. / Controlling the Self-Injection Threshold in Laser Wakefield Accelerators. In: Physical Review Letters. 2018 ; Vol. 121, No. 15.
@article{532b786a966d497480b6a48e7fef215c,
title = "Controlling the Self-Injection Threshold in Laser Wakefield Accelerators",
abstract = "Controlling the parameters of a laser plasma accelerated electron beam is a topic of intense research with a particular focus placed on controlling the injection phase of electrons into the accelerating structure from the background plasma. An essential prerequisite for high-quality beams is dark-current free acceleration (i.e., no electrons accelerated beyond those deliberately injected). We show that small-scale density ripples in the background plasma are sufficient to cause the uncontrolled (self-)injection of electrons. Such ripples can be as short as ∼50 μm and can therefore not be resolved by standard interferometry. Background free injection with substantially improved beam characteristics (divergence and pointing) is demonstrated in a gas cell designed for a controlled gas flow. The results are supported by an analytical theory as well as 3D particle in cell simulations.",
author = "S. Kuschel and Schwab, {M. B.} and M. Yeung and D. Hollatz and A. Seidel and W. Ziegler and A. S{\"a}vert and Kaluza, {M. C.} and M. Zepf",
year = "2018",
month = "10",
day = "8",
doi = "10.1103/PhysRevLett.121.154801",
language = "English",
volume = "121",
journal = "Physical Review Letters",
issn = "0031-9007",
publisher = "American Physical Society",
number = "15",

}

Kuschel, S, Schwab, MB, Yeung, M, Hollatz, D, Seidel, A, Ziegler, W, Sävert, A, Kaluza, MC & Zepf, M 2018, 'Controlling the Self-Injection Threshold in Laser Wakefield Accelerators', Physical Review Letters, vol. 121, no. 15, 154801. https://doi.org/10.1103/PhysRevLett.121.154801

Controlling the Self-Injection Threshold in Laser Wakefield Accelerators. / Kuschel, S.; Schwab, M. B.; Yeung, M.; Hollatz, D.; Seidel, A.; Ziegler, W.; Sävert, A.; Kaluza, M. C.; Zepf, M.

In: Physical Review Letters, Vol. 121, No. 15, 154801, 08.10.2018.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Controlling the Self-Injection Threshold in Laser Wakefield Accelerators

AU - Kuschel, S.

AU - Schwab, M. B.

AU - Yeung, M.

AU - Hollatz, D.

AU - Seidel, A.

AU - Ziegler, W.

AU - Sävert, A.

AU - Kaluza, M. C.

AU - Zepf, M.

PY - 2018/10/8

Y1 - 2018/10/8

N2 - Controlling the parameters of a laser plasma accelerated electron beam is a topic of intense research with a particular focus placed on controlling the injection phase of electrons into the accelerating structure from the background plasma. An essential prerequisite for high-quality beams is dark-current free acceleration (i.e., no electrons accelerated beyond those deliberately injected). We show that small-scale density ripples in the background plasma are sufficient to cause the uncontrolled (self-)injection of electrons. Such ripples can be as short as ∼50 μm and can therefore not be resolved by standard interferometry. Background free injection with substantially improved beam characteristics (divergence and pointing) is demonstrated in a gas cell designed for a controlled gas flow. The results are supported by an analytical theory as well as 3D particle in cell simulations.

AB - Controlling the parameters of a laser plasma accelerated electron beam is a topic of intense research with a particular focus placed on controlling the injection phase of electrons into the accelerating structure from the background plasma. An essential prerequisite for high-quality beams is dark-current free acceleration (i.e., no electrons accelerated beyond those deliberately injected). We show that small-scale density ripples in the background plasma are sufficient to cause the uncontrolled (self-)injection of electrons. Such ripples can be as short as ∼50 μm and can therefore not be resolved by standard interferometry. Background free injection with substantially improved beam characteristics (divergence and pointing) is demonstrated in a gas cell designed for a controlled gas flow. The results are supported by an analytical theory as well as 3D particle in cell simulations.

UR - http://www.scopus.com/inward/record.url?scp=85054849025&partnerID=8YFLogxK

U2 - 10.1103/PhysRevLett.121.154801

DO - 10.1103/PhysRevLett.121.154801

M3 - Article

C2 - 30362794

AN - SCOPUS:85054849025

VL - 121

JO - Physical Review Letters

JF - Physical Review Letters

SN - 0031-9007

IS - 15

M1 - 154801

ER -