Correlation of optical emission and ion flux with GaN etch rate in inductively coupled Ar/Cl-2 plasma etching

S.A. Rizvi, P.D. Maguire, C.M.O. Mahony, O.A. Okpalugo, C.S. Corr, Bill Graham, S.M. Morley

Research output: Contribution to conferencePaper

Original languageEnglish
Pages112-115
Number of pages4
Publication statusPublished - Jul 2002
EventInternational Workshop on Nitride Semiconductors (IWN 2002) - Aachen, Germany
Duration: 01 Jul 200201 Jul 2002

Conference

ConferenceInternational Workshop on Nitride Semiconductors (IWN 2002)
CountryGermany
CityAachen
Period01/07/200201/07/2002

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