Dense bulk silicon oxycarbide glasses obtained by spark plasma sintering

M. Alejandra Mazo*, Cristina Palencia, Andrés Nistal, Fausto Rubio, Juan Rubio, José Luis Oteo

*Corresponding author for this work

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

Dense silicon oxycarbide glasses (SiOC) have been produced by spark plasma sintering (SPS) of SiOC powders. Raw powders were obtained by pyrolysis under nitrogen at 1100°C of tetraethylorthosilcate/polydimethylsiloxane (TEOS/PDMS) hybrids. SPS experiments were carried out at 1300 and 1500°C at 10 and 80MPa and then were studied by chemical analysis, 29Si and 13C MAS NMR, ATR, Raman, XRD, FE-SEM, density, porosity, microhardness (H v) and thermal conductivity (K). The SiOC materials are formed by Si xOC 4-x units within a silica matrix where silicon carbide and graphite nanodomains are also present. After the SPS treatment the silicon carbide crystallite size is close to 2.5nm. At 1300°C and 1500°C the carbon nanodomain size is close to 3nm and 2nm, respectively. H v values vary from 3.4 to 9.15GPa, for 30% and 1% of porosity, respectively. Finally, K is always close to 1.38Wm -1K -1.

Original languageEnglish
Pages (from-to)3369-3378
Number of pages10
JournalJournal of the European Ceramic Society
Volume32
Issue number12
DOIs
Publication statusPublished - Sep 2012
Externally publishedYes

Fingerprint

Spark plasma sintering
Silicon
Silicon carbide
Glass
Powders
Porosity
Graphite
Polydimethylsiloxane
Crystallite size
Silicon Dioxide
Density (specific gravity)
Microhardness
Thermal conductivity
Pyrolysis
Nitrogen
Carbon
Silica
Nuclear magnetic resonance
Scanning electron microscopy
Chemical analysis

Keywords

  • Hardness
  • Nanocomposite
  • Sintering
  • Spark plasma sintering
  • Thermal conductivity

Cite this

Mazo, M. Alejandra ; Palencia, Cristina ; Nistal, Andrés ; Rubio, Fausto ; Rubio, Juan ; Oteo, José Luis. / Dense bulk silicon oxycarbide glasses obtained by spark plasma sintering. In: Journal of the European Ceramic Society. 2012 ; Vol. 32, No. 12. pp. 3369-3378.
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abstract = "Dense silicon oxycarbide glasses (SiOC) have been produced by spark plasma sintering (SPS) of SiOC powders. Raw powders were obtained by pyrolysis under nitrogen at 1100°C of tetraethylorthosilcate/polydimethylsiloxane (TEOS/PDMS) hybrids. SPS experiments were carried out at 1300 and 1500°C at 10 and 80MPa and then were studied by chemical analysis, 29Si and 13C MAS NMR, ATR, Raman, XRD, FE-SEM, density, porosity, microhardness (H v) and thermal conductivity (K). The SiOC materials are formed by Si xOC 4-x units within a silica matrix where silicon carbide and graphite nanodomains are also present. After the SPS treatment the silicon carbide crystallite size is close to 2.5nm. At 1300°C and 1500°C the carbon nanodomain size is close to 3nm and 2nm, respectively. H v values vary from 3.4 to 9.15GPa, for 30{\%} and 1{\%} of porosity, respectively. Finally, K is always close to 1.38Wm -1K -1.",
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Mazo, MA, Palencia, C, Nistal, A, Rubio, F, Rubio, J & Oteo, JL 2012, 'Dense bulk silicon oxycarbide glasses obtained by spark plasma sintering', Journal of the European Ceramic Society, vol. 32, no. 12, pp. 3369-3378. https://doi.org/10.1016/j.jeurceramsoc.2012.03.033

Dense bulk silicon oxycarbide glasses obtained by spark plasma sintering. / Mazo, M. Alejandra; Palencia, Cristina; Nistal, Andrés; Rubio, Fausto; Rubio, Juan; Oteo, José Luis.

In: Journal of the European Ceramic Society, Vol. 32, No. 12, 09.2012, p. 3369-3378.

Research output: Contribution to journalArticle

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T1 - Dense bulk silicon oxycarbide glasses obtained by spark plasma sintering

AU - Mazo, M. Alejandra

AU - Palencia, Cristina

AU - Nistal, Andrés

AU - Rubio, Fausto

AU - Rubio, Juan

AU - Oteo, José Luis

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AB - Dense silicon oxycarbide glasses (SiOC) have been produced by spark plasma sintering (SPS) of SiOC powders. Raw powders were obtained by pyrolysis under nitrogen at 1100°C of tetraethylorthosilcate/polydimethylsiloxane (TEOS/PDMS) hybrids. SPS experiments were carried out at 1300 and 1500°C at 10 and 80MPa and then were studied by chemical analysis, 29Si and 13C MAS NMR, ATR, Raman, XRD, FE-SEM, density, porosity, microhardness (H v) and thermal conductivity (K). The SiOC materials are formed by Si xOC 4-x units within a silica matrix where silicon carbide and graphite nanodomains are also present. After the SPS treatment the silicon carbide crystallite size is close to 2.5nm. At 1300°C and 1500°C the carbon nanodomain size is close to 3nm and 2nm, respectively. H v values vary from 3.4 to 9.15GPa, for 30% and 1% of porosity, respectively. Finally, K is always close to 1.38Wm -1K -1.

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