Dependence of the interfacial capacitance on measurement regime used for investigation of thin film ferroelectric capacitors

L.J. Sinnamon; J. McAneney; Robert Bowman; Marty Gregg

doi:10.1063/1.1522476

Dependence of the interfacial capacitance on measurement regime used for investigation of thin film ferroelectric capacitors

L.J. Sinnamon
, J. McAneney
, Robert Bowman
, Marty Gregg

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	736-744
Number of pages	9
Journal	Journal of Applied Physics
Volume	93
Issue number	1
DOIs	https://doi.org/10.1063/1.1522476
Publication status	Published - 01 Jan 2003

ASJC Scopus subject areas

General Physics and Astronomy
Physics and Astronomy (miscellaneous)

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10.1063/1.1522476

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@article{11c899f35fb54716844d83eeeaa30492,

title = "Dependence of the interfacial capacitance on measurement regime used for investigation of thin film ferroelectric capacitors",

author = "L.J. Sinnamon and J. McAneney and Robert Bowman and Marty Gregg",

year = "2003",

month = jan,

day = "1",

doi = "10.1063/1.1522476",

language = "English",

volume = "93",

pages = "736--744",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "1",

}

TY - JOUR

T1 - Dependence of the interfacial capacitance on measurement regime used for investigation of thin film ferroelectric capacitors

AU - Sinnamon, L.J.

AU - McAneney, J.

AU - Bowman, Robert

AU - Gregg, Marty

PY - 2003/1/1

Y1 - 2003/1/1

UR - https://www.scopus.com/pages/publications/0037246548

U2 - 10.1063/1.1522476

DO - 10.1063/1.1522476

M3 - Article

SN - 0021-8979

VL - 93

SP - 736

EP - 744

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 1

ER -

Dependence of the interfacial capacitance on measurement regime used for investigation of thin film ferroelectric capacitors

ASJC Scopus subject areas

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