TY - JOUR
T1 - Discharge kinetics of inductively coupled oxygen plasmas
T2 - Experiment and model
AU - Corr, C.S.
AU - Gomez, S.
AU - Graham, W.G.
PY - 2012/10/1
Y1 - 2012/10/1
N2 - In this paper, neutral and charged particle dynamics in both the capacitive and inductive modes of an inductively coupled oxygen discharge are presented. Langmuir probes, laser-assisted photodetachment and two-photon laser-induced fluorescence are employed to measure plasma parameters in the 13.56MHz system for a range of plasma powers and gas pressures. It is found that the capacitive mode is more electronegative with lower molecular dissociation compared with the inductive mode. However, the negative ion density in each mode is comparable. A maximum is observed in the negative ion density and fraction with pressure for both modes. The experimental measurements are supplemented by a global model, which includes capacitive and inductive coupling effects. The model and experiments demonstrate that negative ion loss is dominated by ion-ion recombination and electron detachment at low pressures (
AB - In this paper, neutral and charged particle dynamics in both the capacitive and inductive modes of an inductively coupled oxygen discharge are presented. Langmuir probes, laser-assisted photodetachment and two-photon laser-induced fluorescence are employed to measure plasma parameters in the 13.56MHz system for a range of plasma powers and gas pressures. It is found that the capacitive mode is more electronegative with lower molecular dissociation compared with the inductive mode. However, the negative ion density in each mode is comparable. A maximum is observed in the negative ion density and fraction with pressure for both modes. The experimental measurements are supplemented by a global model, which includes capacitive and inductive coupling effects. The model and experiments demonstrate that negative ion loss is dominated by ion-ion recombination and electron detachment at low pressures (
UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-84867268638&partnerID=8YFLogxK
U2 - 10.1088/0963-0252/21/5/055024
DO - 10.1088/0963-0252/21/5/055024
M3 - Article
AN - SCOPUS:84867268638
SN - 0963-0252
VL - 21
JO - Plasma Sources Science and Technology
JF - Plasma Sources Science and Technology
IS - 5
ER -