Dopant transport in tungsten silicide layers for application in SOI technology

S. Liao, Michael Bain, Paul Baine, John Montgomery, David McNeill, Mervyn Armstrong, Harold Gamble

Research output: Contribution to conferencePaper

LanguageEnglish
Pages0-0
Number of pages1
Publication statusPublished - Dec 2009
EventMaterials Ireland Conference - Cork, Ireland
Duration: 01 Dec 200901 Dec 2009

Conference

ConferenceMaterials Ireland Conference
CountryIreland
CityCork
Period01/12/200901/12/2009

Cite this

Liao, S., Bain, M., Baine, P., Montgomery, J., McNeill, D., Armstrong, M., & Gamble, H. (2009). Dopant transport in tungsten silicide layers for application in SOI technology. 0-0. Paper presented at Materials Ireland Conference, Cork, Ireland.
Liao, S. ; Bain, Michael ; Baine, Paul ; Montgomery, John ; McNeill, David ; Armstrong, Mervyn ; Gamble, Harold. / Dopant transport in tungsten silicide layers for application in SOI technology. Paper presented at Materials Ireland Conference, Cork, Ireland.1 p.
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year = "2009",
month = "12",
language = "English",
pages = "0--0",
note = "Materials Ireland Conference ; Conference date: 01-12-2009 Through 01-12-2009",

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Liao, S, Bain, M, Baine, P, Montgomery, J, McNeill, D, Armstrong, M & Gamble, H 2009, 'Dopant transport in tungsten silicide layers for application in SOI technology' Paper presented at Materials Ireland Conference, Cork, Ireland, 01/12/2009 - 01/12/2009, pp. 0-0.

Dopant transport in tungsten silicide layers for application in SOI technology. / Liao, S.; Bain, Michael; Baine, Paul; Montgomery, John; McNeill, David; Armstrong, Mervyn; Gamble, Harold.

2009. 0-0 Paper presented at Materials Ireland Conference, Cork, Ireland.

Research output: Contribution to conferencePaper

TY - CONF

T1 - Dopant transport in tungsten silicide layers for application in SOI technology

AU - Liao, S.

AU - Bain, Michael

AU - Baine, Paul

AU - Montgomery, John

AU - McNeill, David

AU - Armstrong, Mervyn

AU - Gamble, Harold

PY - 2009/12

Y1 - 2009/12

M3 - Paper

SP - 0

EP - 0

ER -

Liao S, Bain M, Baine P, Montgomery J, McNeill D, Armstrong M et al. Dopant transport in tungsten silicide layers for application in SOI technology. 2009. Paper presented at Materials Ireland Conference, Cork, Ireland.