Effect of deposition temperature on the formation of CoSi2 through the rapid thermal annealing of CVD cobalt

Mervyn Armstrong, Michael Bain, Harold Gamble

Research output: Contribution to journalArticle

2 Citations (Scopus)
Original languageEnglish
Pages (from-to)336-342
Number of pages7
JournalMicroelectronic Engineering
Volume76(1-4)
Issue number1-4
Publication statusPublished - Oct 2004

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics

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