Effect of deposition temperature on the formation of CoSi2 through the rapid thermal annealing of CVD cobalt

Mervyn Armstrong, Michael Bain, Harold Gamble

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	336-342
Number of pages	7
Journal	Microelectronic Engineering
Volume	76(1-4)
Issue number	1-4
Publication status	Published - Oct 2004

ASJC Scopus subject areas

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title = "Effect of deposition temperature on the formation of CoSi2 through the rapid thermal annealing of CVD cobalt",

author = "Mervyn Armstrong and Michael Bain and Harold Gamble",

year = "2004",

month = oct,

language = "English",

volume = "76(1-4)",

pages = "336--342",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

number = "1-4",

}

TY - JOUR

T1 - Effect of deposition temperature on the formation of CoSi2 through the rapid thermal annealing of CVD cobalt

AU - Armstrong, Mervyn

AU - Bain, Michael

AU - Gamble, Harold

PY - 2004/10

Y1 - 2004/10

UR - https://www.scopus.com/pages/publications/4544261205

M3 - Article

SN - 0167-9317

VL - 76(1-4)

SP - 336

EP - 342

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 1-4

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