Effect of Rapid Thermal Annealing on the Structure and Magnetic Properties of Chemical Vapour Deposition Cobalt Layers

N. Deo, Michael Bain, John Montgomery, Harold Gamble

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Future read heads in hard disc storage require high conformal coatings of metal magnetic layers over high aspect ratio profiles. This paper describes pioneering work on the use of MOCVD for the deposition of cobalt layers. While pure cobalt layers could be deposited at 400C their magnetic properties are poor. It was found that the magnetic properties of the layers could be significantly enhanced with an optimised rapid thermal anneal. This work was sponsored by Seagate Technology and led to a follow up PhD studentship on the co-deposition of cobalt and iron by MOCVD.
Original languageEnglish
Article number10N307
Pages (from-to)10N307-1-10N307-3
Number of pages3
JournalJournal of Applied Physics
Volume97 (10)
Issue number10
DOIs
Publication statusPublished - 15 May 2005

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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