Electron dynamics and frequency coupling in a radio-frequency capacitively biased planar coil inductively coupled plasma system

M. Zaka-ul-Islam, D. O'Connell, W. G. Graham, T. Gans

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

The electron dynamics in a planar coil inductively coupled plasma (ICP) system with a capacitively biased electrode is investigated using space and phase resolved optical emission spectroscopy. The two power source frequencies are exact multiple of each other and phase-locked. In this configuration, the system is investigated when the coil is operated in both E-mode and H-mode. The results show that in a phase synchronized RF biased ICP, the electrode bias power couples with the capacitive contribution of the coil, in both E-mode and H-modes, similar to dual-frequency capacitively coupled plasmas (2f-CCPs). It is also demonstrated that in H-mode, the phase between the electrode bias frequency and the ICP coil frequency influences the electron heating, similar to the electrical asymmetry effect in 2f-CCPs.

Original languageEnglish
Article number044007
Number of pages9
JournalPlasma Sources Science and Technology
Volume24
Issue number4
Early online date15 Jul 2015
DOIs
Publication statusPublished - Aug 2015

Keywords

  • inductively coupled plasma
  • plasma diagnostics
  • RF biased ICP
  • space and phase resolved optical emission spectroscopy (PROES)

ASJC Scopus subject areas

  • Condensed Matter Physics

Fingerprint Dive into the research topics of 'Electron dynamics and frequency coupling in a radio-frequency capacitively biased planar coil inductively coupled plasma system'. Together they form a unique fingerprint.

Cite this