Energy distributions of copper ions and atoms sputtered by atomic and molecular ions

L. Wang, R.M. Nor, Bill Graham

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Non-resonant multiphoton ionization combined with quadrupole and time-of-flight analysis has been used to study sputtering by both atomic and molecular ion beams. The mass spectra and energy distributions of both sputtered atoms and secondary ions produced by 3.6 keV Ar+, N+, N-2(+), CF2+ and CF3+ ion bombardment at 45 degrees to a polycrystalline copper target have been measured. The energy distributions of the copper ions and atoms are found to be different and quite complex. The ion distributions can generally be described by a linear collision cascade model, with possible evidence for a knock-on contribution. The sputtered atom distributions are partially described by a combination of linear collision cascade and dense cascade (thermal spike) models. This is interpreted as support for a time-evolving sputtering mechanism.
Original languageEnglish
Pages (from-to)2379-2388
Number of pages10
JournalJournal Of Physics D-applied Physics
Volume30
Publication statusPublished - 1997

Fingerprint Dive into the research topics of 'Energy distributions of copper ions and atoms sputtered by atomic and molecular ions'. Together they form a unique fingerprint.

Cite this