Estimation and Control in Semiconductor Etch: Practice and Possibilities

John Ringwood, Giorgio Bacelli, Shane Lynn, Beibei Ma, Emanuele Ragnoli, Sean McLoone

Research output: Contribution to journalArticlepeer-review

30 Citations (Scopus)
Original languageEnglish
Pages (from-to)87-97
JournalIEEE Transactions on Semiconductor Manufacturing
Volume23
Issue number1
Publication statusPublished - 2010

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