Original language | English |
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Pages (from-to) | 87-97 |
Journal | IEEE Transactions on Semiconductor Manufacturing |
Volume | 23 |
Issue number | 1 |
Publication status | Published - 2010 |
Estimation and Control in Semiconductor Etch: Practice and Possibilities
John Ringwood, Giorgio Bacelli, Shane Lynn, Beibei Ma, Emanuele Ragnoli, Sean McLoone
Research output: Contribution to journal › Article › peer-review
39
Citations
(Scopus)