Fabrication of nano-scale optical patterns in amorphous silicon carbide with focused ion beam writing

Tanya Tsvetkova, Satoshi Takahashi, Anatoly Zayats, Paul Dawson, R. Turner, L. Bischoff, O. Angelov, D. Dimova-Malinovska

Research output: Contribution to conferencePaper

17 Citations (Scopus)
Original languageEnglish
Pages100-105
Number of pages6
DOIs
Publication statusPublished - Jun 2005
Event5th International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION2004) - Kazimierz Dolny, Poland
Duration: 01 Jun 200501 Jun 2005

Conference

Conference5th International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION2004)
CountryPoland
CityKazimierz Dolny
Period01/06/200501/06/2005

Cite this

Tsvetkova, T., Takahashi, S., Zayats, A., Dawson, P., Turner, R., Bischoff, L., Angelov, O., & Dimova-Malinovska, D. (2005). Fabrication of nano-scale optical patterns in amorphous silicon carbide with focused ion beam writing. 100-105. Paper presented at 5th International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION2004), Kazimierz Dolny, Poland. https://doi.org/10.1016/j.vacuum.2005.02.001