Fabrication of nano-scale optical patterns in amorphous silicon carbide with focused ion beam writing

Tanya Tsvetkova; Satoshi Takahashi; Anatoly Zayats; Paul Dawson; R. Turner; L. Bischoff; O. Angelov; D. Dimova-Malinovska

doi:10.1016/j.vacuum.2005.02.001

Fabrication of nano-scale optical patterns in amorphous silicon carbide with focused ion beam writing

Tanya Tsvetkova, Satoshi Takahashi, Anatoly Zayats, Paul Dawson, R. Turner, L. Bischoff, O. Angelov, D. Dimova-Malinovska

Research output: Contribution to conference › Paper

19 Citations (Scopus)

Original language	English
Pages	100-105
Number of pages	6
DOIs	https://doi.org/10.1016/j.vacuum.2005.02.001
Publication status	Published - Jun 2005
Event	5th International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION2004) - Kazimierz Dolny, Poland Duration: 01 Jun 2005 → 01 Jun 2005

Conference

Conference	5th International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION2004)
Country/Territory	Poland
City	Kazimierz Dolny
Period	01/06/2005 → 01/06/2005

Access to Document

10.1016/j.vacuum.2005.02.001

Cite this

Tsvetkova, T., Takahashi, S., Zayats, A., Dawson, P., Turner, R., Bischoff, L., Angelov, O., & Dimova-Malinovska, D. (2005). Fabrication of nano-scale optical patterns in amorphous silicon carbide with focused ion beam writing. 100-105. Paper presented at 5th International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION2004), Kazimierz Dolny, Poland. https://doi.org/10.1016/j.vacuum.2005.02.001

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title = "Fabrication of nano-scale optical patterns in amorphous silicon carbide with focused ion beam writing",

author = "Tanya Tsvetkova and Satoshi Takahashi and Anatoly Zayats and Paul Dawson and R. Turner and L. Bischoff and O. Angelov and D. Dimova-Malinovska",

year = "2005",

month = jun,

doi = "10.1016/j.vacuum.2005.02.001",

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Tsvetkova, T, Takahashi, S, Zayats, A, Dawson, P, Turner, R, Bischoff, L, Angelov, O & Dimova-Malinovska, D 2005, 'Fabrication of nano-scale optical patterns in amorphous silicon carbide with focused ion beam writing', Paper presented at 5th International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION2004), Kazimierz Dolny, Poland, 01/06/2005 - 01/06/2005 pp. 100-105. https://doi.org/10.1016/j.vacuum.2005.02.001

Fabrication of nano-scale optical patterns in amorphous silicon carbide with focused ion beam writing. / Tsvetkova, Tanya; Takahashi, Satoshi; Zayats, Anatoly et al.
2005. 100-105 Paper presented at 5th International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION2004), Kazimierz Dolny, Poland.

Research output: Contribution to conference › Paper

TY - CONF

T1 - Fabrication of nano-scale optical patterns in amorphous silicon carbide with focused ion beam writing

AU - Tsvetkova, Tanya

AU - Takahashi, Satoshi

AU - Zayats, Anatoly

AU - Dawson, Paul

AU - Turner, R.

AU - Bischoff, L.

AU - Angelov, O.

AU - Dimova-Malinovska, D.

PY - 2005/6

Y1 - 2005/6

U2 - 10.1016/j.vacuum.2005.02.001

DO - 10.1016/j.vacuum.2005.02.001

M3 - Paper

SP - 100

EP - 105

T2 - 5th International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION2004)

Y2 - 1 June 2005 through 1 June 2005

ER -