Feature Selection for Anomaly Detection Using Optical Emission Spectroscopy

Luca Puggini, Seán McLoone

Research output: Contribution to journalArticle

2 Citations (Scopus)
328 Downloads (Pure)

Abstract

To maintain the pace of development set by Moore's law, production processes in semiconductor manufacturing are becoming more and more complex. The development of efficient and interpretable anomaly detection systems is fundamental to keeping production costs low. As the dimension of process monitoring data can become extremely high anomaly detection systems are impacted by the curse of dimensionality, hence dimensionality reduction plays an important role. Classical dimensionality reduction approaches, such as Principal Component Analysis, generally involve transformations that seek to maximize the explained variance. In datasets with several clusters of correlated variables the contributions of isolated variables to explained variance may be insignificant, with the result that they may not be included in the reduced data representation. It is then not possible to detect an anomaly if it is only reflected in such isolated variables. In this paper we present a new dimensionality reduction technique that takes account of such isolated variables and demonstrate how it can be used to build an interpretable and robust anomaly detection system for Optical Emission Spectroscopy data.

Original languageEnglish
Pages (from-to)132-137
Number of pages6
JournalIFAC-PapersOnLine
Volume49
Issue number5
Early online date26 Jul 2016
DOIs
Publication statusPublished - 2016

Keywords

  • Dimensionality Reduction
  • Fault Detection
  • OC-SVM
  • OES Spectrum
  • Semiconductors

ASJC Scopus subject areas

  • Control and Systems Engineering

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