Ferroelastic domain wall dynamics in ferroelectric bilayers

V. Anbusathaiah, S. Jesse, M. A. Arredondo, F. C. Kartawidjaja, O. S. Ovchinnikov, J. Wang, S. V. Kalinin, V. Nagarajan*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

30 Citations (Scopus)
394 Downloads (Pure)

Abstract

High-performance piezoelectric devices based on ferroelectric materials rely heavily on ferroelastic domain wall switching. Here we present visual evidence for the local mechanisms that underpin domain wall dynamics in ferroelastic nanodomains. State-of-the-art band excitation switching spectroscopy piezoforce microscopy (PFM) reveals distinct origins for the reversible and irreversible components of ferroelastic domain motion. Extrapolating the PFM images to case for uniform fields, we posit that, while reversible switching is essentially a linear motion of the ferroelastic domains, irreversible switching takes place via domain wall twists. Critically, real-time images of in situ domain dynamics under an external bias reveal that the reversible component leads to reduced coercive voltages. Finally, we show that junctions representing three-domain architecture represent facile interfaces for ferroelastic domain switching, and are likely responsible for irreversible processes in the uniform fields. The results presented here thus provide (hitherto missing) fundamental insight into the correlations between the physical mechanisms that govern ferroelastic domain behavior and the observed functional response in domain-engineered thin film ferroelectric devices.

Original languageEnglish
Pages (from-to)5316-5325
Number of pages10
JournalActa Materialia
Volume58
Issue number16
Early online date09 Jul 2010
DOIs
Publication statusPublished - 01 Sept 2010
Externally publishedYes

ASJC Scopus subject areas

  • Ceramics and Composites
  • Metals and Alloys
  • Polymers and Plastics
  • Electronic, Optical and Magnetic Materials

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