Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

Timo Gans; J. Schulze; D. O'Connell; U. Czarnetzki; R. Faulkner; A.R. Ellingboe; M.M. Turner

doi:10.1063/1.2425044

Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

Timo Gans, J. Schulze, D. O'Connell, U. Czarnetzki, R. Faulkner, A.R. Ellingboe, M.M. Turner

School of Mathematics and Physics

Research output: Contribution to journal › Article › peer-review

164 Citations (Scopus)

Abstract

An industrial, confined, dual frequency, capacitively coupled, radio-frequency plasma etch reactor ExelanÂ®, Lam Research has been modified for spatially resolved optical measurements. Space and phase resolved optical emission spectroscopy yields insight into the dynamics of the discharge. A strong coupling of the two frequencies is observed in the emission profiles. Consequently, the ionization dynamics, probed through excitation, is determined by both frequencies. The control of plasma density by the high frequency is, therefore, also influenced by the low frequency. Hence, separate control of plasma density and ion energy is rather complex.

Original language	English
Article number	261502
Pages (from-to)	261502-1-261502-3
Number of pages	3
Journal	Applied Physics Letters
Volume	89
Issue number	26
DOIs	https://doi.org/10.1063/1.2425044
Publication status	Published - Dec 2006

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.2425044

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title = "Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas",

abstract = "An industrial, confined, dual frequency, capacitively coupled, radio-frequency plasma etch reactor Exelan{\^A}{\textregistered}, Lam Research has been modified for spatially resolved optical measurements. Space and phase resolved optical emission spectroscopy yields insight into the dynamics of the discharge. A strong coupling of the two frequencies is observed in the emission profiles. Consequently, the ionization dynamics, probed through excitation, is determined by both frequencies. The control of plasma density by the high frequency is, therefore, also influenced by the low frequency. Hence, separate control of plasma density and ion energy is rather complex.",

author = "Timo Gans and J. Schulze and D. O'Connell and U. Czarnetzki and R. Faulkner and A.R. Ellingboe and M.M. Turner",

year = "2006",

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AU - Gans, Timo

AU - Schulze, J.

AU - O'Connell, D.

AU - Czarnetzki, U.

AU - Faulkner, R.

AU - Ellingboe, A.R.

AU - Turner, M.M.

PY - 2006/12

Y1 - 2006/12

N2 - An industrial, confined, dual frequency, capacitively coupled, radio-frequency plasma etch reactor ExelanÂ®, Lam Research has been modified for spatially resolved optical measurements. Space and phase resolved optical emission spectroscopy yields insight into the dynamics of the discharge. A strong coupling of the two frequencies is observed in the emission profiles. Consequently, the ionization dynamics, probed through excitation, is determined by both frequencies. The control of plasma density by the high frequency is, therefore, also influenced by the low frequency. Hence, separate control of plasma density and ion energy is rather complex.

AB - An industrial, confined, dual frequency, capacitively coupled, radio-frequency plasma etch reactor ExelanÂ®, Lam Research has been modified for spatially resolved optical measurements. Space and phase resolved optical emission spectroscopy yields insight into the dynamics of the discharge. A strong coupling of the two frequencies is observed in the emission profiles. Consequently, the ionization dynamics, probed through excitation, is determined by both frequencies. The control of plasma density by the high frequency is, therefore, also influenced by the low frequency. Hence, separate control of plasma density and ion energy is rather complex.

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JO - Applied Physics Letters

JF - Applied Physics Letters

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Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

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