Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

Timo Gans, J. Schulze, D. O'Connell, U. Czarnetzki, R. Faulkner, A.R. Ellingboe, M.M. Turner

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Abstract

An industrial, confined, dual frequency, capacitively coupled, radio-frequency plasma etch reactor Exelan®, Lam Research has been modified for spatially resolved optical measurements. Space and phase resolved optical emission spectroscopy yields insight into the dynamics of the discharge. A strong coupling of the two frequencies is observed in the emission profiles. Consequently, the ionization dynamics, probed through excitation, is determined by both frequencies. The control of plasma density by the high frequency is, therefore, also influenced by the low frequency. Hence, separate control of plasma density and ion energy is rather complex.
Original languageEnglish
Article number261502
Pages (from-to)261502-1-261502-3
Number of pages3
JournalApplied Physics Letters
Volume89
Issue number26
DOIs
Publication statusPublished - Dec 2006

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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    Gans, T., Schulze, J., O'Connell, D., Czarnetzki, U., Faulkner, R., Ellingboe, A. R., & Turner, M. M. (2006). Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas. Applied Physics Letters, 89(26), 261502-1-261502-3. [261502]. https://doi.org/10.1063/1.2425044