Hydrogen and helium implantation in germanium for semiconductor layer transfer applications

Richard Hurley, Paul Rainey, Y.W. Low, Paul Baine, David McNeill, Neil Mitchell, Harold Gamble, Mervyn Armstrong

Research output: Contribution to conferencePaper

Original languageEnglish
Pages56-56
Number of pages1
Publication statusPublished - Jun 2010
EventVIII-th INTERNATIONAL CONFERENCE on ION IMPLANTATION AND OTHER APPLICATIONS OF IONS AND ELECTRONS - Kazimierz Dolny, Poland
Duration: 01 Jun 201001 Jun 2010

Conference

ConferenceVIII-th INTERNATIONAL CONFERENCE on ION IMPLANTATION AND OTHER APPLICATIONS OF IONS AND ELECTRONS
CountryPoland
CityKazimierz Dolny
Period01/06/201001/06/2010

Cite this

Hurley, R., Rainey, P., Low, Y. W., Baine, P., McNeill, D., Mitchell, N., ... Armstrong, M. (2010). Hydrogen and helium implantation in germanium for semiconductor layer transfer applications. 56-56. Paper presented at VIII-th INTERNATIONAL CONFERENCE on ION IMPLANTATION AND OTHER APPLICATIONS OF IONS AND ELECTRONS, Kazimierz Dolny, Poland.