Hydrogen and helium implantation in germanium for semiconductor layer transfer applications

Richard Hurley, Paul Rainey, Y.W. Low, Paul Baine, David McNeill, Neil Mitchell, Harold Gamble, Mervyn Armstrong

Research output: Contribution to conferencePaper

Original languageEnglish
Pages56-56
Number of pages1
Publication statusPublished - Jun 2010
EventVIII-th INTERNATIONAL CONFERENCE on ION IMPLANTATION AND OTHER APPLICATIONS OF IONS AND ELECTRONS - Kazimierz Dolny, Poland
Duration: 01 Jun 201001 Jun 2010

Conference

ConferenceVIII-th INTERNATIONAL CONFERENCE on ION IMPLANTATION AND OTHER APPLICATIONS OF IONS AND ELECTRONS
CountryPoland
CityKazimierz Dolny
Period01/06/201001/06/2010

Cite this

Hurley, R., Rainey, P., Low, Y. W., Baine, P., McNeill, D., Mitchell, N., Gamble, H., & Armstrong, M. (2010). Hydrogen and helium implantation in germanium for semiconductor layer transfer applications. 56-56. Paper presented at VIII-th INTERNATIONAL CONFERENCE on ION IMPLANTATION AND OTHER APPLICATIONS OF IONS AND ELECTRONS, Kazimierz Dolny, Poland.