Identifying key process characteristics and predicting Etch Rate from High Dimensionality Datasets

E. Ragnoli, Seán McLoone, S. Lynn, J. Ringwood, N. MacGearailt

Research output: Contribution to conferencePaper

Original languageEnglish
Publication statusPublished - 2009
EventIEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Berlin, Germany
Duration: 01 May 200901 May 2009

Conference

ConferenceIEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
CountryGermany
CityBerlin
Period01/05/200901/05/2009

Cite this

Ragnoli, E., McLoone, S., Lynn, S., Ringwood, J., & MacGearailt, N. (2009). Identifying key process characteristics and predicting Etch Rate from High Dimensionality Datasets. Paper presented at IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC), Berlin, Germany.