Internal photoemission study on charge trapping behaviour in rapid thermal oxides on strained-Si/SiGe heterolayers

Mervyn Armstrong, Harold Gamble, M.K. Bera, C. Mahata, S. Bhattacharya, A.K. Chakraborty, C.K. Maiti

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)2971-2977
Number of pages7
JournalApplied Surface Science
Volume255
Publication statusPublished - Sep 2008

Cite this

Armstrong, M., Gamble, H., Bera, M. K., Mahata, C., Bhattacharya, S., Chakraborty, A. K., & Maiti, C. K. (2008). Internal photoemission study on charge trapping behaviour in rapid thermal oxides on strained-Si/SiGe heterolayers. Applied Surface Science, 255, 2971-2977.