Kinetic Monte Carlo study of electrochemical growth in a heteroepitaxial system

M.C. Gimenez, Mario Del Popolo, E.P.M. Leiva

Research output: Contribution to journalArticlepeer-review

20 Citations (Scopus)

Abstract

Structural and kinetic aspects of 2-D irreversible metal deposition under potentiostatic conditions are analyzed by means of dynamic Monte Carlo simulations employing embedded atom potentials for a model system. Three limiting models, all considering adatom diffusion, were employed to describe adatom deposition. The first model (A) considers adatom deposition on any free substrate site on the surface at the same rate. The second model (B) considers adatom deposition only on substrate sites which exhibit no neighboring sites occupied by adatoms. The third model (C) allows deposition at higher rates on sites presenting neighboring sites occupied by adatoms. Under the proper conditions, the coverage (theta) versus time (t) relationship for the three cases can be heuristically fitted to the functional form theta = 1 - exp(-betat(alpha)), where alpha and beta are parameters. We suggest that the value of the parameter alpha can be employed to distinguish experimentally between the three cases. While model A trivially delivers a = 1, models B and C are characterized by alpha 1, respectively.
Original languageEnglish
Pages (from-to)9087-9094
Number of pages8
JournalLangmuir
Volume18
Issue number23
DOIs
Publication statusPublished - 12 Nov 2002

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

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