Liquid source misted chemical deposition process of three-dimensional nano-ferroelectrics with substrate heating

S. Kawasaki, J.F. Scott, H. Fan, G. Catalan, M.M. Saad, Marty Gregg, M.A. Correa, F.D. Morrison, T. Tatsuta, O. Tsuji

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

A modification of liquid source misted chemical deposition process (LSMCD) with heating mist and substrate has developed, and this enabled to control mist penetrability and fluidity on sidewalls of three-dimensional structures and ensure step coverage. A modified LSMCD process allowed a combinatorial approach of Pb(Zr,Ti)O-3 (PZT) thin films and carbon nanotubes (CNTs) toward ultrahigh integration density of ferroelectric random access memories (FeRAMs). The CNTs templates were survived during the crystallization process of deposited PZT film onto CNTs annealed at 650 degrees C in oxygen ambient due to a matter of minute process, so that the thermal budget is quite small. The modified LSMCD process opens up the possibility to realize the nanoscale capacitor structure of ferroelectric PZT film with CNTs electrodes toward ultrahigh integration density FeRAMs.
Original languageEnglish
Pages (from-to)180-186
Number of pages7
JournalIntegrated Ferroelectrics
Volume95
Issue number1
DOIs
Publication statusPublished - 2007

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Condensed Matter Physics

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