Low temperature epitaxy of Si/Si1-xGex/Si multi-layers by low pressure RTCVD for very thin SOI applications

David McNeill, D.L. Gay, X. Li, Mervyn Armstrong, Harold Gamble

Research output: Contribution to conference › Paper

Original language	English
Pages	307-313
Number of pages	7
Publication status	Published - Apr 1998
Event	MRS Symposium Proceedings - San Francisco, United States Duration: 01 Apr 1998 → 01 Apr 1998

Cite this

@conference{6b79967812b14e77909fa5670028a50b,

title = "Low temperature epitaxy of Si/Si1-xGex/Si multi-layers by low pressure RTCVD for very thin SOI applications",

author = "David McNeill and D.L. Gay and X. Li and Mervyn Armstrong and Harold Gamble",

year = "1998",

month = apr,

language = "English",

pages = "307--313",

note = "MRS Symposium Proceedings ; Conference date: 01-04-1998 Through 01-04-1998",

}