Low Temperature Plasma enhanced Chemical Vapour Deposition of Tungsten and Tungsten Nitride.

Mervyn Armstrong, Michael Bain, Harold Gamble

Research output: Contribution to conferencePaper

Original languageEnglish
Pages0-0
Number of pages1
Publication statusPublished - Jun 2002
Event4th Intl Conf on Materials for Microelectronics - Espoo, Finland
Duration: 01 Jun 200201 Jun 2002

Conference

Conference4th Intl Conf on Materials for Microelectronics
CountryFinland
CityEspoo
Period01/06/200201/06/2002

Cite this

Armstrong, M., Bain, M., & Gamble, H. (2002). Low Temperature Plasma enhanced Chemical Vapour Deposition of Tungsten and Tungsten Nitride.. 0-0. Paper presented at 4th Intl Conf on Materials for Microelectronics, Espoo, Finland.