Manufacture processes for GPSOI substrates and their influence on cross-talk suppression

Paul Baine, Harold Gamble, Mervyn Armstrong, David McNeill, Michael Bain, J.S. Hamel, M. Kraft

Research output: Contribution to conferencePaper

Original languageEnglish
Pages57-63
Number of pages7
Publication statusPublished - Apr 2003
EventElectrochemical Society Proc, Semiconductor Wafer Bonding VII, Science Technology and Applications - Proc of the Intl Symposium - Paris, France
Duration: 01 Apr 200301 Apr 2003

Conference

ConferenceElectrochemical Society Proc, Semiconductor Wafer Bonding VII, Science Technology and Applications - Proc of the Intl Symposium
CountryFrance
CityParis
Period01/04/200301/04/2003

Cite this

Baine, P., Gamble, H., Armstrong, M., McNeill, D., Bain, M., Hamel, J. S., & Kraft, M. (2003). Manufacture processes for GPSOI substrates and their influence on cross-talk suppression. 57-63. Paper presented at Electrochemical Society Proc, Semiconductor Wafer Bonding VII, Science Technology and Applications - Proc of the Intl Symposium, Paris, France.