Mask assisted fabrication of nanoislands of BiFeO3 by ion beam milling

A. Morelli*, F. Johann, N. Schammelt, D. McGrouther, I. Vrejoiu

*Corresponding author for this work

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

We report on a low-damage method for direct and rapid fabrication of arrays of epitaxial BiFeO3(BFO) nanoislands. An array of aluminium dots is evaporated through a stencil mask on top of an epitaxial BiFeO3 thin film. Low energy focused ion beam milling of an area several microns wide containing the array-covered film leads to removal of the bismuth ferrite in between the aluminium-masked dots. By chemical etching of the remaining aluminium, nanoscale epitaxial bismuth ferrite islands with diameter ∼250 nm were obtained. Piezoresponse force microscopy showed that as-fabricated structures exhibited good piezoelectric and ferroelectric properties, with polarization state retention of several days.
Original languageEnglish
Article number154101
Pages (from-to)1-4
Number of pages4
JournalJournal of Applied Physics
Volume113
DOIs
Publication statusPublished - 2013

Keywords

  • FILMS

Cite this

Morelli, A., Johann, F., Schammelt, N., McGrouther, D., & Vrejoiu, I. (2013). Mask assisted fabrication of nanoislands of BiFeO3 by ion beam milling. Journal of Applied Physics, 113, 1-4. [154101]. https://doi.org/10.1063/1.4801904