Mask assisted fabrication of nanoislands of BiFeO3 by ion beam milling

A. Morelli*, F. Johann, N. Schammelt, D. McGrouther, I. Vrejoiu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)


We report on a low-damage method for direct and rapid fabrication of arrays of epitaxial BiFeO3(BFO) nanoislands. An array of aluminium dots is evaporated through a stencil mask on top of an epitaxial BiFeO3 thin film. Low energy focused ion beam milling of an area several microns wide containing the array-covered film leads to removal of the bismuth ferrite in between the aluminium-masked dots. By chemical etching of the remaining aluminium, nanoscale epitaxial bismuth ferrite islands with diameter ∼250 nm were obtained. Piezoresponse force microscopy showed that as-fabricated structures exhibited good piezoelectric and ferroelectric properties, with polarization state retention of several days.
Original languageEnglish
Article number154101
Pages (from-to)1-4
Number of pages4
JournalJournal of Applied Physics
Publication statusPublished - 2013




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