Molecular Dynamics simulation of silicon sputtering: sensitivity to the choice of potential

B.J. Thijsse, Peter Klaver, E.F.C. Haddeman

Research output: Contribution to journalArticlepeer-review

23 Citations (Scopus)
Original languageEnglish
Pages (from-to)29-38
Number of pages10
JournalApplied Surface Science
Volume231-232
Publication statusPublished - 15 Jun 2004

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

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