Nanotribology at high temperatures

Saurav Goel, Alexander Stukowski, Gaurav Goel, Xichun Luo, Robert L Reuben

Research output: Contribution to journalArticle

6 Citations (Scopus)
Original languageEnglish
Pages (from-to)586-588
Number of pages3
JournalBeilstein Journal of Nanotechnology
Volume3
Issue number1
DOIs
Publication statusPublished - 2012

Cite this

Goel, S., Stukowski, A., Goel, G., Luo, X., & Reuben, R. L. (2012). Nanotribology at high temperatures. Beilstein Journal of Nanotechnology, 3(1), 586-588. https://doi.org/10.3762/bjnano.3.68
Goel, Saurav ; Stukowski, Alexander ; Goel, Gaurav ; Luo, Xichun ; Reuben, Robert L. / Nanotribology at high temperatures. In: Beilstein Journal of Nanotechnology. 2012 ; Vol. 3, No. 1. pp. 586-588.
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Goel, S, Stukowski, A, Goel, G, Luo, X & Reuben, RL 2012, 'Nanotribology at high temperatures', Beilstein Journal of Nanotechnology, vol. 3, no. 1, pp. 586-588. https://doi.org/10.3762/bjnano.3.68

Nanotribology at high temperatures. / Goel, Saurav; Stukowski, Alexander; Goel, Gaurav ; Luo, Xichun; Reuben, Robert L.

In: Beilstein Journal of Nanotechnology, Vol. 3, No. 1, 2012, p. 586-588.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Nanotribology at high temperatures

AU - Goel, Saurav

AU - Stukowski, Alexander

AU - Goel, Gaurav

AU - Luo, Xichun

AU - Reuben, Robert L

PY - 2012

Y1 - 2012

U2 - 10.3762/bjnano.3.68

DO - 10.3762/bjnano.3.68

M3 - Article

VL - 3

SP - 586

EP - 588

JO - Beilstein Journal of Nanotechnology

JF - Beilstein Journal of Nanotechnology

SN - 2190-4286

IS - 1

ER -

Goel S, Stukowski A, Goel G, Luo X, Reuben RL. Nanotribology at high temperatures. Beilstein Journal of Nanotechnology. 2012;3(1):586-588. https://doi.org/10.3762/bjnano.3.68