Abstract
Semiconductor manufacturers are increasingly reliant on optical emission spectroscopy (OES) to source information on plasma characteristics and process change. However, OES data is characterized by high dimension and by highly correlated variables. This makes it difficult to interpret process behaviour using OES measurements. It is therefore desirable to obtain more compact representations of the data using dimensionality reduction techniques such as Forward Selection Component Analysis (FSCA). In this paper we investigate non-linear extensions of FSCA based on polynomial expansions and Extreme Learning Machines and show, through a combination of simulated examples and OES recordings from a semiconductor plasma etch process, that they can yield more compact representations that classical FSCA.
Original language | English |
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Title of host publication | 2016 27th Irish Signals and Systems Conference, ISSC 2016 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Number of pages | 6 |
ISBN (Electronic) | 9781509034093 |
DOIs | |
Publication status | Published - 04 Aug 2016 |
Event | 27th Irish Signals and Systems Conference, ISSC 2016 - Londonderry, United Kingdom Duration: 21 Jun 2016 → 22 Jun 2016 |
Conference
Conference | 27th Irish Signals and Systems Conference, ISSC 2016 |
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Country/Territory | United Kingdom |
City | Londonderry |
Period | 21/06/2016 → 22/06/2016 |
ASJC Scopus subject areas
- Signal Processing
- Computer Networks and Communications
- Electrical and Electronic Engineering