Novel TiO2 CVD films for semiconductor photocatalysis

Andrew Mills, N. Elliott, I.P. Parkin, S.A. O'Neill, R.J.H. Clark

Research output: Contribution to journalArticlepeer-review

235 Citations (Scopus)


A novel CVD film of titanium(IV) oxide has been prepared on glass, via the reaction of titanium(IV) chloride and ethyl acetate, using a CVD technique. The film is clear, very robust mechanically and comprised of a thin (24 nm) layer of nanocrystalline anatase titania that absorbs light of lambda
Original languageEnglish
Pages (from-to)171-179
Number of pages9
JournalJournal of Photochemistry and Photobiology A: Chemistry
Issue number1-3
Publication statusPublished - 23 Aug 2002

ASJC Scopus subject areas

  • Bioengineering
  • Physical and Theoretical Chemistry


Dive into the research topics of 'Novel TiO2 CVD films for semiconductor photocatalysis'. Together they form a unique fingerprint.

Cite this