Novel TiO2 CVD films for semiconductor photocatalysis

Andrew Mills, N. Elliott, I.P. Parkin, S.A. O'Neill, R.J.H. Clark

Research output: Contribution to journalArticle

220 Citations (Scopus)

Abstract

A novel CVD film of titanium(IV) oxide has been prepared on glass, via the reaction of titanium(IV) chloride and ethyl acetate, using a CVD technique. The film is clear, very robust mechanically and comprised of a thin (24 nm) layer of nanocrystalline anatase titania that absorbs light of lambda
Original languageEnglish
Pages (from-to)171-179
Number of pages9
JournalJournal of Photochemistry and Photobiology A: Chemistry
Volume151
Issue number1-3
Publication statusPublished - 23 Aug 2002

ASJC Scopus subject areas

  • Bioengineering
  • Physical and Theoretical Chemistry

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  • Cite this

    Mills, A., Elliott, N., Parkin, I. P., O'Neill, S. A., & Clark, R. J. H. (2002). Novel TiO2 CVD films for semiconductor photocatalysis. Journal of Photochemistry and Photobiology A: Chemistry, 151(1-3), 171-179.