Plasma Etch Process Virtual Metrology using Aggregative Linear Regression

P. K S Prakash, Seán McLoone

Research output: Contribution to conferencePaperpeer-review

Original languageEnglish
Publication statusPublished - 2011
EventThird International Conference of Soft Computing and Pattern Recognition (SocPaR 2011) - Dalian, China
Duration: 14 Oct 201116 Oct 2011

Conference

ConferenceThird International Conference of Soft Computing and Pattern Recognition (SocPaR 2011)
CountryChina
CityDalian
Period14/10/201116/10/2011

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