Plasma power measurement and hysteresis in the E-H transition of a rf inductively coupled plasma system

A. M. Daltrini, S. A. Moshkalev, T. J. Morgan, R. B. Piejak, W. G. Graham

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Abstract

An experimental investigation of the argon plasma behavior near the E-H transition in an inductively coupled Gaseous Electronics Conference reference cell is reported. Electron density and temperature, ion density, argon metastable density, and optical emission measurements have been made as function of input power and gas pressure. When plotted versus plasma power, applied power corrected for coil and hardware losses, no hysteresis is observed in the measured plasma parameter dependence at the E-H mode transition. This suggests that hysteresis in the E-H mode transition is due to ignoring inherent power loss, primarily in the matching system.
Original languageEnglish
Article number061504
Number of pages3
JournalApplied Physics Letters
Volume92
Issue number6
DOIs
Publication statusPublished - 11 Feb 2008

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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