Ion implantation is a process in which ions are accelerated toward a substrate at energies high enough to bury them just below the surface substrate in order to modify the surface characteristics. Laser-produced plasma is a very suitable and low cost technique in the production of ion sources. In this work, a laser ion source is developed by a UV pulsed laser of about 108 W/cm2 power density, employing a C target and a post ion acceleration of 40 kV to increase the ion energy. In this work, we implanted C ions on ultra-high-molecular-weight-polyethylene (UHMWPE) and low-density polyethylene (LDPE). We present the preliminary results of surface property modifications for both samples. In particular, we have studied the modifications of the surface micro-hardness of the polymers by applying the "scratch test" method as well as the hydrophilicity modifications by the contact angle measurements.
|Number of pages||4|
|Journal||Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms|
|Publication status||Published - May 2008|
Copyright 2008 Elsevier B.V., All rights reserved.
- Ion implantation
- Laser-produced plasma
- Low-density polyethylene
ASJC Scopus subject areas
- Nuclear and High Energy Physics