SATURATED AND NEAR-DIFFRACTION-LIMITED OPERATION OF AN XUV LASER AT 23.6 NM

A. Carillon, H.Z. Chen, P. Dhez, L. Dwivedi, J. Jacoby, P. Jaegle, G. Jamelot, J. Zhang, M.H. Key, A. Kidd, A. Klisnick, R. Kodama, J. Krishnan, Ciaran Lewis, D. Neely, P. Norreys, D. Oneill, G.J. Pert, S.A. Ramsden, J.P. RaucourtG.J. Tallents, J. Uhomoibhi

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174 Citations (Scopus)

Abstract

Amplification of spontaneous emission (ASE) at 23.6 nm has been studied in a Ge plasma heated by a 1 TW infrared laser pulse. The exponent of the axial gain reached 21 in a geometry with Fresnel number less-than-or-equal-to 1. Two plasma columns of combined length up to 36 mm were used with an extreme ultraviolet mirror giving double-pass amplification. Saturation of the ASE output was observed. The beam divergence was about 8 x diffraction limited with a brightness estimated at 10(14) W cm-2 sr-1. The feedback from the mirror was significantly reduced probably by radiation damage from the plasma.
Original languageEnglish
Pages (from-to)2917-2920
Number of pages4
JournalPhysical Review Letters
Volume68
Publication statusPublished - 1992

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