Selective deposition of CVD iron on silicon dioxide and tungsten

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

Original language	English
Pages (from-to)	2229-2233
Number of pages	5
Journal	Microelectronic Engineering
Volume	83(11-12)
Issue number	11-12
DOIs	https://doi.org/10.1016/j.mee.2006.10.008
Publication status	Published - Nov 2006

ASJC Scopus subject areas

@article{f538327a893e491592559c23553d655d,

title = "Selective deposition of CVD iron on silicon dioxide and tungsten",

author = "John Montgomery",

year = "2006",

month = nov,

doi = "10.1016/j.mee.2006.10.008",

language = "English",

volume = "83(11-12)",

pages = "2229--2233",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

number = "11-12",

}

TY - JOUR

T1 - Selective deposition of CVD iron on silicon dioxide and tungsten

AU - Montgomery, John

PY - 2006/11

Y1 - 2006/11

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U2 - 10.1016/j.mee.2006.10.008

DO - 10.1016/j.mee.2006.10.008

M3 - Article

SN - 0167-9317

VL - 83(11-12)

SP - 2229

EP - 2233

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 11-12

ER -