Semipacked columns with atomic layer-deposited alumina as a stationary phase

Hamza Shakeel, Gary W. Rice, Masoud Agah

Research output: Contribution to journalArticlepeer-review

39 Citations (Scopus)


A new approach is described for utilizing atomic layer-deposited alumina as a gas–solid stationary phase medium for microfabricated gas chromatography columns. After atomic layer deposition (ALD) of aluminum oxide, a chloroalkylsilane is utilized to functionalize the oxide surface to improve peak symmetry and retention times. Semipacked columns (1 m-long, 190 μm-wide, 180 μm-deep with 20 μm-embedded circular micropillars) were utilized for validation of this newly developed approach. ALD-treated/silane-functionalized columns efficiently separated a multicomponent sample mixture and yielded 4200 plates per meter. The ALD-based stationary phase is found to be stable after multiple injections and at high operating temperatures. The proposed method facilitates a simple and wafer-level coating scheme that provides a highly controllable film thickness. The inherent properties of atomic layer deposition provide an easy route to coat very challenging microfabricated column designs.
Original languageEnglish
Pages (from-to)641-646
Number of pages6
Early online date09 Jul 2014
Publication statusPublished - Nov 2014


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