Study of the emission characteristics of a rf plasma source for atomic oxygen: Measurements of atom, ion, and electron fluxes

Robert McCullough

Research output: Contribution to journalArticle

15 Citations (Scopus)
Original languageEnglish
Pages (from-to)993-997
Number of pages5
JournalJournal Of Vacuum Science & Technology A-vacuum Surfaces And Films
Volume19
Issue number3
Publication statusPublished - May 2001

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

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