Study of the emission characteristics of a rf plasma source for atomic oxygen: Measurements of atom, ion, and electron fluxes

Robert McCullough

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	993-997
Number of pages	5
Journal	Journal Of Vacuum Science & Technology A-vacuum Surfaces And Films
Volume	19
Issue number	3
Publication status	Published - May 2001

ASJC Scopus subject areas

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