Super-Resolution Defect Characterization Using Microwave Near-Field Resonance Reflectometry and Cross-correlation Image Processing

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Abstract

A super-resolution defect characterization technique based on near-field resonance reflectometry and cross-correlation image processing is proposed in this paper. The hardware part of the microwave imaging system employs a novel loaded aperture (LA) probe which allows collimation of the electromagnetic field to approximately λ/10 focal spot(s) at λ/100 to λ/10 stand-off distances, λ being the wavelength of radiation in free space. The characteristic raw image spatial resolution of the LA probe is around λ/10 in one dimension with amplitude contrast/sensitivity exceeding 10-20dB. It is demonstrated that the LA spatial resolution can be at least two times enhanced in two dimensions in the image plane using basic cross-correlation image processing while retaining a very high level of amplitude contrast of at least 10dB.
Original languageEnglish
Number of pages11
JournalSensing and Imaging
Volume18
Issue number7
Early online date21 Jan 2017
DOIs
Publication statusPublished - Dec 2017

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